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Different representatives of the carbonitride class differ from each other in their physical properties [1-2]. Thin films prepared depending on the C:N ratio in the chemical composition of carbonitride are considered excellent compounds due to their mechanical strength, heat and radiation resistance [3]. Their superior properties extend their application in protective coatings, microelectronics, and nuclear technologies [4]. Among these materials, it is possible to mention compounds obtained by adding Si, Nb, and Zr nanoparticles to the TiCN matrix. TiSiCN, TiNbCN, and TiZrCN have been confirmed as radiation-resistant materials in space and nuclear research. In the research work, SEM and AFM studies of the surface morphology of materials irradiated at room temperature with 200 keV He ions were carried out. SEM analysis showed that TiCN coatings exhibit a dense, columnar microstructure typical of PVD-deposited films. The surface morphology shows a uniform grain distribution with grain sizes ranging from 50 to 150 nm. AFM surface scans showed that the TiCN coatings had a relatively smooth surface with root-mean-square (RMS) roughness values between 2.5 and 5.8 nm, depending on the deposition parameters. The smooth surface morphology contributes to improved tribological performance and reduced friction. These results are consistent with statistical findings and experimental parameters. Furthermore, exposure to high ion bombardment exceeding 10¹⁷ ions/cm², along with the effects of backscattered ions, may lead to surface degradation phenomena such as etching, nodular defects, and the emergence of structural defects including craters, cracks, and pinholes.
